Piranha solution

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Piranha solution, also known as piranha etch, is a mixture of sulfuric acid (H₂SO₄) and hydrogen peroxide (H₂O₂). The resulting mixture is used to clean organic residues off substrates, for example silicon wafers.^[1] Because the mixture is a strong oxidizing agent, it will decompose most organic matter, and it will also hydroxylate most surfaces (by adding –OH groups), making them highly hydrophilic (water-compatible). This means the solution can also easily dissolve fabric and skin, potentially causing severe damage and chemical burns in case of inadvertent contact. It is named after the piranha fish due to its tendency to rapidly dissolve and 'consume' organic materials through vigorous chemical reactions.