Scanning probe lithography

Scanning probe lithography^[1] (SPL) describes a set of nanolithographic methods to pattern material on the nanoscale using scanning probes. It is a direct-write, mask-less approach which bypasses the diffraction limit and can reach resolutions below 10 nm.^[2] It is considered an alternative lithographic technology often used in academic and research environments. The term scanning probe lithography was coined after the first patterning experiments with scanning probe microscopes (SPM) in the late 1980s.^[3]

^ Garcia, Ricardo; Knoll, Armin W.; Riedo, Elisa (August 2014). "Advanced scanning probe lithography". Nature Nanotechnology. 9 (8): 577–587. arXiv:1505.01260. Bibcode:2014NatNa...9..577G. doi:10.1038/nnano.2014.157. ISSN 1748-3387. PMID 25091447. S2CID 205450948.
^ Cite error: The named reference :0 was invoked but never defined (see the help page).
^ U.S. patent 4,785,189

[1] Garcia, Ricardo; Knoll, Armin W.; Riedo, Elisa (August 2014). "Advanced scanning probe lithography". Nature Nanotechnology. 9 (8): 577–587. arXiv:1505.01260. Bibcode:2014NatNa...9..577G. doi:10.1038/nnano.2014.157. ISSN 1748-3387. PMID 25091447. S2CID 205450948.

[:0-2] Cite error: The named reference :0 was invoked but never defined (see the help page).

[3] U.S. patent 4,785,189

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