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Semiconductor device fabrication

MOSFET scaling (process nodes)
20 μm – 1968 10 μm – 1971 6 μm – 1974 3 μm – 1977 1.5 μm – 1981 1 μm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 90 nm – 2003 65 nm – 2005 45 nm – 2007 32 nm – 2009 28 nm – 2010 22 nm – 2012 14 nm – 2014 10 nm – 2016 7 nm – 2018 5 nm – 2020 3 nm – 2022
Future 2 nm ~ 2025 1 nm ~ 2027
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
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Listed are many semiconductor scale examples for various metal–oxide–semiconductor field-effect transistor (MOSFET, or MOS transistor) semiconductor manufacturing process nodes.

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