3 nm process

Semiconductor device fabrication
MOSFET scaling (process nodes)
020 µm – 1968 010 µm – 1971 006 µm – 1974 003 µm – 1977  1.5 µm – 1981 001 µm – 1984 800 nm – 1987 600 nm – 1990 350 nm – 1993 250 nm – 1996 180 nm – 1999 130 nm – 2001 090 nm – 2003 065 nm – 2005 045 nm – 2007 032 nm – 2009 028 nm – 2010 022 nm – 2012 014 nm – 2014 010 nm – 2016 007 nm – 2018 005 nm – 2020 003 nm – 2022
Future 002 nm ~ 2024
Half-nodes Density CMOS Device (multi-gate) Moore's law Transistor count Semiconductor Industry Nanoelectronics
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In semiconductor manufacturing, the "3 nm" process is the next die shrink after the "5 nm" MOSFET (metal–oxide–semiconductor field-effect transistor) technology node. South Korean chipmaker Samsung started shipping its "3 nm" gate all around (GAA) process, named "3GAA", in mid-2022.^[1][2] On 29 December 2022, Taiwanese chip manufacturer TSMC announced that volume production using its "3 nm" semiconductor node ("N3") was under way with good yields.^[3] An enhanced "3 nm" chip process called "N3E" may have started production in 2023.^[4] American manufacturer Intel planned to start 3 nm production in 2023.^[5][6][7]

Samsung's "3 nm" process is based on GAAFET (gate-all-around field-effect transistor) technology, a type of multi-gate MOSFET technology, while TSMC's "3 nm" process still uses FinFET (fin field-effect transistor) technology,^[8] despite TSMC developing GAAFET transistors.^[9] Specifically, Samsung plans to use its own variant of GAAFET called MBCFET (multi-bridge channel field-effect transistor).^[10] Intel's process (dubbed "Intel 3", without the "nm" suffix) will use a refined, enhanced and optimized version of FinFET technology compared to its previous process nodes in terms of performance gained per watt, use of EUV lithography, and power and area improvement.^[11]

The term "3 nanometer" has no direct relation to any actual physical feature (such as gate length, metal pitch or gate pitch) of the transistors. According to the projections contained in the 2021 update of the International Roadmap for Devices and Systems published by IEEE Standards Association Industry Connection, a "3 nm" node is expected to have a contacted gate pitch of 48 nanometers, and a tightest metal pitch of 24 nanometers.^[12]

However, in real world commercial practice, "3 nm" is used primarily as a marketing term by individual microchip manufacturers (foundries) to refer to a new, improved generation of silicon semiconductor chips in terms of increased transistor density (i.e. a higher degree of miniaturization), increased speed and reduced power consumption.^[13][14] There is no industry-wide agreement among different manufacturers about what numbers would define a "3 nm" node.^[15] Typically the chip manufacturer refers to its own previous process node (in this case the "5 nm" node) for comparison. For example, TSMC has stated that its "3 nm" FinFET chips will reduce power consumption by 25–30% at the same speed, increase speed by 10–15% at the same amount of power and increase transistor density by about 33% compared to its previous "5 nm" FinFET chips.^[16][17] On the other hand, Samsung has stated that its "3 nm" process will reduce power consumption by 45%, improve performance by 23%, and decrease surface area by 16% compared to its previous "5 nm" process.^[18] EUV lithography faces new challenges at 3 nm which lead to the required use of multipatterning.^[19]